Oxygen by Inert Gas Fusion Infrared Detection for Silicon Wafers

The O836Si was designed to meet the low level sensitivity and high precision demands of the silicon industry. By combining the unmatched sensitivity of our solid-state infrared detection system with our novel sample loading system and programmable impulse furnace, the O836Si provides accurate and precise oxygen results in materials such as silicon wafers. The low level sensitivity and high precision has also been applied to the metals industry, determining the oxygen content in high purity copper for the electronics industry.